SpRAM Pluton eLC-HD Generator TSMC 180 nm eLL
Low fabrication costs |
Low Power |
Dolphin Integration provides customers with new capabilities for designing extremely low-leakage circuits in the new eLL 180 nm process variant. Dolphin Integration’s offering is based on a comprehensive set of silicon-proven libraries, which enable the best combination of logic density and low power consumption, including the capability to embed power-islets and to operate at very low voltage.
Thanks to the combined technology benefits of the TSMC process and of innovative libraries, common Users have the opportunity to divide leakage by more than 100 at 180 nm eLL! This eLL platform is Foundry Sponsored.
Positioning & Differentiators
Availables modes and add-ons
Byte write mode - optional
For more flexibility towards ultimate power savings, the capability of Byte-mode can be implemented in the RAM for write operations.
Key Benefits
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Reduced die cost
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Ultra low power
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Ultra low leakage
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Easy integration
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The Dolphin quality

Flexibility
| Generator flexibility |
Min |
Max |
Granularity |
| Memory Bit Capacity |
512 |
512 k |
NA |
| Number of Words |
128 |
64 k |
1 |
| Number of Bits per Word |
4 |
64 |
1 |
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